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Nattakorn Borwornpornmetee. Modification of Morphological and Wetting Properties of Nanocrystalline FeSi₂ and Fe₃Si Films through Plasma Etching. Master's Degree(Applied Physics). King Mongkut's Institute of Technology Ladkrabang. Central Library. : King Mongkut's Institute of Technology Ladkrabang, 2022.
Modification of Morphological and Wetting Properties of Nanocrystalline FeSi₂ and Fe₃Si Films through Plasma Etching
LCSH:
Photography
-- Films
LCSH:
Ultrastructure (Biology)
Abstract:
This research was regarding nanocrystalline FeSi2 films and Fe₃Si films that were epitaxially formed on Si(111) wafers via facing-targets direct-current sputtering at a room temperature and substrate temperature of 300°c, respectively. Both films were divided and etched by Ar plasma at different power of 50, 100, and 150 W. From the scanning electron microscopy and atomic force microscope images, the surface morphology of the as-created nanocrystalline FeSi2 films showed numerous small uniform crystallites and roughness of 1.04 A. The surface for all etched nanocrystalline FeSi2 films showed appearance of hole and increase in roughness. The Fe3Si samples also share similar trait. XPS result showed that films cover by carbon which was a source of hydrophobicity. After etching, the content of carbon decrease and oxide presence increase on both films as the power increased. The average contact angle of the unetched nanocrystalline FeSi₂ film surface was 100.55°, which is hydrophobic. The nanocrystalline FeSi₂ film surface reached a minimum contact angle of 35.65°, which belong to hydrophilic state, when the etching power was increased to 150 W. The average contact angle for the surface of the as-created Fe₃Si films possessed a contact angle of 101.70°. Fe₃Si also shift from hydrophobic to hydrophilic after etching. The contact angle decreased to 67.05° at an etching power of 150 W. The mechanical properties of both films rarely affect by Ar plasma
King Mongkut's Institute of Technology Ladkrabang. Central Library
Address:
BANGKOK
Email:
Lifelong@kmitl.ac.th
Name: Nathaporn Promros
Role:
Thesis Advisor
Created:
2022
Modified:
2566-05-22
Issued:
2023-05-22
วิทยานิพนธ์/Thesis
application/pdf
eng
DegreeName: Master of Science
Descipline: Applied Physics
Level: Master's Degree
©copyrights King Mongkut's Institute of Technology Ladkrabang
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0.02654 วินาที
Nattakorn Borwornpornmetee
| Title | Contributor | Type |
|---|---|---|
| Modification of Morphological and Wetting Properties of Nanocrystalline FeSi₂ and Fe₃Si Films through Plasma Etching
สถาบันเทคโนโลยีพระจอมเกล้าเจ้าคุณทหารลาดกระบัง Nattakorn Borwornpornmetee | Nathaporn Promros | วิทยานิพนธ์/Thesis |
Nathaporn Promros
| Title | Creator | Type and Date Create |
|---|---|---|
| Modification of Morphological and Wetting Properties of Nanocrystalline FeSi₂ and Fe₃Si Films through Plasma Etching
สถาบันเทคโนโลยีพระจอมเกล้าเจ้าคุณทหารลาดกระบัง Nathaporn Promros | Nattakorn Borwornpornmetee | วิทยานิพนธ์/Thesis |
| Electrical characterization in heterojunction devices of semiconducting Iron disilicide/silicon and nanocrystalline diamond/silicon
สถาบันเทคโนโลยีพระจอมเกล้าเจ้าคุณทหารลาดกระบัง Nathaporn Promros | Rawiwan Chaleawpong | วิทยานิพนธ์/Thesis |