Nano-titanium dioxide thin film in application for photokilling of selected bacteria

Name: Suree Thongwanitniyom

keyword: Nano-titanium Dioxide Thin Film

; Photokilling

Abstract: Titanium dioxide (TiO2) thin films have been deposited on Si-wafer and glass slide by DC reactive magnetron sputtering technique. The effects of deposition parameter such as O2 gas flow rates, substrate-target distances and deposition powers have been investigated. The crystal structure, surface morphology, thickness and transmittance were characterized by grazing-incidence X-ray diffraction (GIXRD), atomic force microscopy (AFM), and spectrophotometer, respectively. Disinfection of surfaces by photo catalytic oxidation with TiO2 and UVA light irradiation was evaluated. The results showed that, all as-deposited films are transparent. The crystal structure from GIXRD results, all as-deposited TiO2 films have crystal structure of TiO2 corresponding to the A(101) and A(200). The crystallinity, thickness, grain size and surface morphology of all as-deposited anatase TiO2 films were varied with deposition parameter. Furthermore, nano-structure anatase TiO2 thin films were obtained for all deposition conditions. In addition, the refractive index and the energy gap of all as-deposited TiO2 films were found in the range 2.34-2.54 and 3.1-3.3 eV, respectively. The as-deposited anatase TiO2 thin film in this work can kill the bacteria when expose to the UVA light.

Burapha University. Library

Address: CHONBURI

Email: buulibrary@buu.ac.th

Name: Nirun Witit-anun

Role: Principal advisor

Name: Pichan Sawangwong

Role: Co-advisor

Name: Adisorn Buranawong

Role: Co-advisor

Created: 2015

Modified: 2564-11-12

Issued: 2015-10-21

วิทยานิพนธ์/Thesis

application/pdf

eng

DegreeName: Doctor of Philosophy

Level: Doctoral Degree

Descipline: Environmental Science

Grantor: Burapha University

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