Implementation of edge detection algorithms to characterize magnetic micropattern fabricated by X-ray lithography

Name: U Phromsuwan

Email : schitnar@wu.ac.th

Name: C Sirisathitkul

Name: Y Sirisathitkul2

Name: C Sriphung

keyword: X-ray lithography

; High aspect ratio microstructure

; SU-8 photoresist

; Image processing

; Edge detection

Abstract: Arrays of SU-8 photoresist pillars (10 μm × 10 μm × 50 μm) on a copper substrate were patterned by X-ray lithography using a synchrotron source. Flat cobalt films can then be sputter-deposited on the chemically stable and mechanically hardened array of SU-8 pillars in spite of geometry distortion and pattern collapse in some regions. Images of these micropillars obtained from an optical microscope and a scanning electron microscope (SEM) were inspected using five different edge detection algorithms. The Canny and Laplacian of Gaussian (LoG) operators can detect the cross sections of micropillars but noise points and lines were included. The outputs from image processing by the Prewitt and Sobel operators yielded lower noise but suffered from discontinuity especially in the case of SEM image. The Roberts Cross edge detector had only weak response to edges of the micropattern under test.

WALAILAK UNIVERSITY. CENTER FOR LIBRARY RESOURCES AND EDUCATIONAL MEDIA

Address: NAKON SI THAMMARAT

Email: clm@wu.ac.th

Created: 2011-10-13

Modified: 2016-06-14

Issued: 2554-10-13

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